Highly Efficient Semiconductor Manufacturing Process Exhaust Gas Scrubbing Material

Features: Novel ammonia removal technology by ionic liquids was developed through increasing intermolecular interactions for improving ammonia absorption efficiency of wet scrubber in semiconductor factories to meet stricter regulatory standards (<1 ppm)

Description

Novel ammonia removal technology by ionic liquids was developed through increasing intermolecular interactions for improving ammonia absorption efficiency of wet scrubber in semiconductor factories to meet stricter regulatory standards (<1 ppm) in 2025.

Dept：Mechanical and Mechatronics Systems Research Laboratories
POC：徐芷涵
Tel：03-5915384
E-mail：juliehsu@itri.org.tw

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