- Home
- Intelligent Systems
- X-ray metrology - Overlay
Intelligent Systems
X-ray metrology - Overlay
- Features
- This technology utilizes X-ray scattering to measure sub-nanometer alignment in the front-end process of semiconductor manufacturing. It provides a non-destructive solution to the challenges of limited penetration and diffraction limits inherent in traditional optical methods.
Description
Reflective Small-Angle X-ray Scattering (RSAXS) is used to measure sub-nanometer overlay in the front-end process. X-ray metrology addresses both the metal material shielding problem and the diffraction limit encountered in optical methods, providing a nondestructive solution for in-line processing. By measuring overlay in a single step and simultaneously analyzing multiple scattering signals received by a 2D X-ray detector, RSAXS offers high throughput and atomic-level measurement precision.Dept：Center for Measurement Standards
POC：柳君諭
Tel：03-5932176
E-mail：ChunYuLiu@itri.org.tw